Semiconductors and Semimetals, Volume 74: Silicon-Germanium Strained Layers and Heterostructures

by Robert K. Willardson (Series Editor), Suresh C. Jain (Editor), Magnus Willander

The study of Silicone Germanium strained layers has broad implications for material scientists and engineers, in particular those working on the design and modelling of semi-conductor devices. Since the publication of the original volume in 1994, there has been a steady flow of new ideas, new understanding, new Silicon-Germanium (SiGe) structures and new devices with enhanced performance. Written for both students and senior researchers, the 2nd edition of "Silicon-Germanium Strained Layers and Heterostructures" provides an essential up-date of this important topic, describing in particular the recent developments in technology and modelling. It is fully-revised and updated 2nd edition incorporating important recent breakthroughs and a complete literature review. The extensive bibliography of over 400 papers provides a comprehensive and coherent overview of the subject. It is appropriate for students and senior researchers.

322 pages, Kindle Edition

First published October 6, 2003