Diamond Thin Films

by John I.B. Wilson

An understanding of thin-film diamond by physical and chemical vapour deposition CVD is of wide application in materials science. This book provides an account of the physical, mechanical and chemical properties of diamond thin films as well as examining the engineering techniques and problems required to exploit them successfully. Diamond Thin Films explores the application and measurement of CVD in existing applications and their potential for new usage. The properties of diamond and the techniques of synthesis are examined in detail, with particular emphasis on diamond growth by CVD and quality, shaping and reaction factors. The areas for future study and application are discussed in terms of current state-of-the-art materials and surface science. This book should be a valuable resource for materials scientists and physicists involved in the study of semi-conductor materials, thin films and surface science.

481 pages, Paperback

First published May 17, 1996