X-ray diffraction at elevated temperatures: A method for in situ process analysis

by D.D.L. Chung; P.W. De Haven; H. Arnold; Debashis Ghosh

268 pp., hardcover, minor library markings, else text clean and binding tight. *Buyer is responsible for any additional duties, taxes, or fees required by recipient's country* - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers.

268 pages, Paperback

Published January 1, 1993